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DIN Standards Committee Materials Testing

Abstract

The method is used to determine the amount of oxygen in the gases of this standard. It determines a proportion between 1 µmol/mol and 10 µmol/mol and can be used to analyze the residual oxygen content in the gases nitrogen, argon, helium, neon and hydrogen. The applicability to other gases and lower detection limits must be checked in each case.

Begin

2025-02-03

Planned document number

DIN 50450-2

Project number

06236881

Responsible national committee

NA 062-05-73 AA - Gas analysis and gas quality  

draft standard

Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell
2025-07
Order from DIN Media

previous edition(s)

Testing of materials for semiconductor technology; determination of impurities in carrier gases and doping gases; determination of oxygen impurity in N₂, Ar, He, Ne and H₂ by using a galvanic cell
1991-03